наноструктуры

Nanostructured Porous Silicon Layers Formation at Low Doses of γ-Radiation

Authors: Bilobrova O. Y., Galushka V. V., Karagaychev A. L., Zharkova E. A., Polyanskaya V. P., Sidorov V. I., Therin D. V., Mantsurov A. A.

We present results of experimental study of nanoporous Si (SiNР) structure formation by using the method of metal-stimulated chemical etching upon irradiation with small doses of γ-radiation directly in the process of production (in situ). It is shown that the radiation leads to an increase of the crystallization of SiNP structures obtained on previously irradiated substrates. Apparently, this can be explained by a decrease in the initial defectiveness of the silicon substrate due to irradiation with small doses of γ-radiation.

Model of the Processes Nanostructure Formation during Plasma Spraying Hydroxyapatite Porous-Powder Coatings

Authors: Lyasnikova A. V., Antonov I. N., Lyasnikov V. N.

We offer a physical model of the process nanostructure formation during plasma spraying hydroxyapatite coatings and described the thermodynamics of heating particle in the plasma torch. We analyzed thermal processes on the base and the formation of thermal fields in the system particle-base by plasma spraying. Possibly that the formation of amorphous coatings, consisting of submicron particles, happened because shear through by contact with the material and base and nanosized crystals appear as a result of very fast cooling (quenching) of the submicron structures.